Intel has completed the assembly of its High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography tool at the company’s R&D site in Hillsboro, Oregon. Built by ASML and delivered in ...

ASML provided Intel, its first customer, with the $380 million Twinscan EXE:5000 High-NA lithography machine. Yesterday, it shipped its second High-NA EUV lithography machine to a mystery customer.

India's Tata Group and Intel (INTC) are collaborating to focus on consumer and enterprise hardware enablement, as well as semiconductor and systems manufacturing to support the Asian country's ...

On April 18, 2024, Intel announced that it had completed the assembly of the industry's first commercial high numerical aperture (NA) extreme ultraviolet (EUV) lithography at its research and ...

Intel has been in the news lately for being the first semiconductor fab to jump aboard the high numerical aperture (high-NA) fabrication train. The company is the first of the big fabs to buy a ...

Investment of up to $4.6 billion will create approximately 2,000 Intel jobs and thousands of indirect supplier and temporary construction jobs. The new facility will help meet demand for assembly and ...

SAN JOSE, Calif. — It appears that Intel Corp. has pushed out the production schedule for its IC-packaging and test plant in Vietnam by three or so quarters due to some unforeseen snags. The Ho Chi ...

Intel Corp. today announced that all the compute modules of Aurora, an exascale supercomputer it’s helping to build for the U.S. Department of Energy, have been installed. The system is a ...